Ma Yi | Department Of Physics North Carolina State University
スポンサーリンク
概要
関連著者
-
Ma Yi
Department Of Physics North Carolina State University
-
Hattangady Sunil
Department Of Materials Science And Engineering North Carolina State University
-
Yasuda T.
Department of Exercise and Sport Science, Tokyo Metropolitan University
-
LUCOVSKY Gerald
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
-
Lee David
Department Of Materials Science And Engineering North Carolina State University
-
Whitten Jerry
Department Of Chemistry North Carolina State University
-
LUCOVSKY G.
Departments of Physics, Materials Science & Engineering, and Electrical & Computer Engineering, Nort
-
Wortman Jimmie
Department Of Physics North Carolina State University
-
JING Ze
Department of Physics, North Carolina State University
-
LU Zhong
Department of Physics, North Carolina State University
-
MISRA Veena
Department of Electrical and Computer Engineering, North Carolina State University
-
Jing Ze
Department Of Physics North Carolina State University
-
Lu Zhong
Department Of Physics North Carolina State University
-
Misra Veena
Department Of Electrical And Computer Engineering North Carolina State University
-
Lucovsky G
Departments Of Physics And Electrical And Computer Engineering North Carolina State University
-
Lucovsky Gerald
Department Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nort
-
Lucovsky G.
Department Of Physics North Carolina State University:materials Science And Engineering North Caroli
-
SILVERSTRE C.
Electrical and Computer Engineering, North Carolina State University
-
HAUSER J.
Electrical and Computer Engineering, North Carolina State University
-
Silverstre C.
Electrical And Computer Engineering North Carolina State University
-
Hauser J.
Electrical And Computer Engineering North Carolina State University
-
Lee David
Department Of Biological Science Florida International University
著作論文
- Integration of Plasma-Assisted and Rapid Thermal Processing for Low-Thermal Budget Preparation of Ultra-Thin Dielectrics for Stacked-Gate Device Structures
- Device-Quality SiO_2/Si(100) Interfaces Prepared by a Two-Step Remote Plasma-Assisted Oxidation-Depositon Process