LUCOVSKY G. | Departments of Physics, Materials Science & Engineering, and Electrical & Computer Engineering, Nort

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概要

• 同名の論文著者
• Departments of Physics, Materials Science & Engineering, and Electrical & Computer Engineering, Nortの論文著者

関連著者

• Yasuda T.

  Department of Exercise and Sport Science, Tokyo Metropolitan University

• LUCOVSKY G.

  Departments of Physics, Materials Science & Engineering, and Electrical & Computer Engineering, Nort

• Lucovsky G.

  Department Of Physics North Carolina State University:materials Science And Engineering North Caroli

• Ma Yi

  Department Of Physics North Carolina State University

• Kurz H

  Rwth Aachen Aachen Deu

• Yasuda T

  Joint Research Center For Atom Technology (jrcat)

• Yasuda Tetsuji

  Joint Research Center For Atom Technology(jrcat):national Institute For Advanced Interdisciplinary R

• Kurz H

  Rheinisch‐westfaeilsche Technische Hochsch. Aachen Deu

• Yasuda T

  Joint Research Center For Atom Technology(jrcat):national Institute For Advanced Interdisciplinary R

• Bjorkman C.

  Research Center For Integrated Systems Hiroshima University

• BJORKMAN C.

  Departments of Physics, Materials Science & Engineering, and Electrical & Computer Engineering, Nort

• EMMERICHS U.

  Institute of Semiconductor Electronics II

• MEYER C.

  Institute of Semiconductor Electronics II

• LEO K.

  Institute of Semiconductor Electronics II

• KURZ H.

  Institute of Semiconductor Electronics II

• Lucovsky G

  Departments Of Physics And Electrical And Computer Engineering North Carolina State University

• SILVERSTRE C.

  Electrical and Computer Engineering, North Carolina State University

• HAUSER J.

  Electrical and Computer Engineering, North Carolina State University

• Bjorkman C.

  Departments Of Physics Materials Science & Engineering And Electrical & Computer Engineering

• Silverstre C.

  Electrical And Computer Engineering North Carolina State University

• Hauser J.

  Electrical And Computer Engineering North Carolina State University

• Leo K

  Technische Univ. Dresden Dresden Deu

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著作論文

• Thermal Relaxation Phenomena in the Formation of Device-Quality SiO_2/Si Interfaces
• Device-Quality SiO_2/Si(100) Interfaces Prepared by a Two-Step Remote Plasma-Assisted Oxidation-Depositon Process

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