Ultrathin Nitride/Oxide (N/O) Gate Dielectrics for p^+-poly Gated PMOSFETs Prepared by a Combined Remote Plasma Enhanced CVD/Thermal Oxidation Process
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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Lucovsky Gerald
Department Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nort
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Lucovsky Gerald
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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WU Yider
Departments of Electrical and Computer Engineering, North Carolina State University
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Wu Yider
Departments Of Electrical And Computer Engineering North Carolina State University
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