Behavior of Effective Work Function in Metal/High-K Gate Stack under High Temperature Process
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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Joo Moon
Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University
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Cho Byung
Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University
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BALASUBRAMANIAN N.
Institute of Microelectronics
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Joo Moon
Silicon Nano Device Laboratory Dept. Of Electrical & Computer Engineering Nus
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CHI D.
Institute of Materials Research & Engineering
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KWONG D.-L.
Dept. of ECE, University of Texas
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Kwong D.-l.
Dept. Of Ece University Of Texas
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Cho Byung
Silicon Nano Device Laboratory Dept. Of Electrical & Computer Engineering Nus
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