Tri-Gate Polycrystalline Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization with Improved Electron Transport Properties (Special Issue : Solid State Devices and Materials (1))
スポンサーリンク
概要
著者
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Kotani Koji
Graduate School Of Engineering Tohoku University
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KUROKI Shin-Ichiro
Graduate School of Engineering, Tohoku University
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FUJII Shuntaro
Graduate School of Engineering, Tohoku University
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Kawasaki Yuya
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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