FUJII Shuntaro | Graduate School of Engineering, Tohoku University
スポンサーリンク
概要
関連著者
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KUROKI Shin-Ichiro
Graduate School of Engineering, Tohoku University
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FUJII Shuntaro
Graduate School of Engineering, Tohoku University
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Kotani Koji
Graduate School Of Engineering Tohoku University
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ITO Takashi
Graduate School of Engineering, Tohoku University
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Numata Masayuki
Graduate School Of Engineering Tohoku University
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Kotani K
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Kotani K
Tohoku Univ. Sendai‐shi Jpn
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ZHU Xiaoli
Graduate School of Engineering, Tohoku University
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Nakajima Anri
Research Center For Nanodevices And Systems Hiroshima University
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Zhu Xiaoli
Tohoku University
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Kotani Koji
Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Ito Takashi
Solution Research Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Kuroki Shin-Ichiro
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Numata Masayuki
Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Fujii Shuntaro
Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Fujii Shuntaro
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Ito Takashi
Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Ito Takashi
Research Institute for Nanodevice and Bio Systems, Hiroshima University, Higashihiroshima, Hiroshima 739-8527, Japan
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Kotani Koji
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Kawasaki Yuya
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
著作論文
- Strain-Induced Back Channel Electron Mobility Enhancement in Polycrystalline Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization
- Lateral Recrystallized Si Thin Films with Large Tensile Strain for High Performance Thin Film Transistors
- Enlargement of Crystal-Grains in Thin Silicon Films Using Continuous-Wave Laser Irradiation
- Tri-Gate Polycrystalline Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization with Improved Electron Transport Properties (Special Issue : Solid State Devices and Materials (1))
- In-Plane Grain Orientation Alignment of Polycrystalline Silicon Films by Normal and Oblique-Angle Ion Implantations
- Analysis of Continuous-Wave Laser Lateral Crystallized Polycrystalline Silicon Thin Films with Large Tensile Strain
- Roughness Reduction in Polycrystalline Silicon Thin Films Formed by Continuous-Wave Laser Lateral Crystallization with Cap SiO2 Thin Films
- Enlargement of Crystal Grains in Thin Silicon Films by Continuous-Wave Laser Irradiation