ZHU Xiaoli | Graduate School of Engineering, Tohoku University

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概要

• 同名の論文著者
• Graduate School of Engineering, Tohoku Universityの論文著者

関連著者

• Kotani Koji

  Graduate School Of Engineering Tohoku University

• ZHU Xiaoli

  Graduate School of Engineering, Tohoku University

• KUROKI Shin-Ichiro

  Graduate School of Engineering, Tohoku University

• ITO Takashi

  Graduate School of Engineering, Tohoku University

• Kotani K

  Department Of Electronic Engineering Graduate School Of Engineering Tohoku University

• Kotani K

  Tohoku Univ. Sendai‐shi Jpn

• Numata Masayuki

  Graduate School Of Engineering Tohoku University

• Zhu Xiaoli

  Tohoku University

• FUJII Shuntaro

  Graduate School of Engineering, Tohoku University

• MISHIMA Yasuyoshi

  Fujitsu Laboratories Ltd.

• Mishima Yasuyoshi

  Advanced Cmos Labolatories Fujitsu Laboratories Ltd.

• FUKUDA Masatoshi

  Fujitsu Laboratories Ltd.

• SHIDO Hideharu

  Fujitsu Laboratories Ltd.

• Shido Hideharu

  Advanced Cmos Labolatories Fujitsu Laboratories Ltd.

• Fukuda Masatoshi

  Advanced Cmos Labolatories Fujitsu Laboratories Ltd.

• Koji Kotani

  Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

• Takashi Ito

  Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

• Shin-Ichiro Kuroki

  Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

• Numata Masayuki

  Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

• Ito Takashi

  Graduate School of Engineering, Tohoku University, 6-6-05 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

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著作論文

• Enhancement of Current Drivability of Nanograting Polycrystalline Silicon Thin-Film Transistors
• Characteristics of Nano-Grating N-Channel MOSFETs for Improved Current Drivability(Semiconductor Materials and Devices)
• Lateral Recrystallized Si Thin Films with Large Tensile Strain for High Performance Thin Film Transistors
• Analysis of Continuous-Wave Laser Lateral Crystallized Polycrystalline Silicon Thin Films with Large Tensile Strain

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