Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask

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概要

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• A possible candidate for carbon contaminant removal in Ru-capped extreme ultraviolet lithography (EUVL) mask is ozone dissolved water (DIO3). However, the use of DIO3 leaves reflectivity loss and serious surface damages on Ru capping layer caused by its high oxidation potential. In this study, an optimum DIO3 cleaning condition for effective carbon cleaning without surface damage was investigated both theoretically and experimentally. The effect of feed gases such as O2, CO2, and N2 of various concentrations were tried during DIO3 generation for oxidation stability on Ru capping layer and N2 added 15 ppm DIO3 was found to be the best condition. However carbon contaminant was ineffectively removed at this condition. Thus megasonic is irradiated during DIO3 process and the results show that carbon is not only completely removed in a shorter time but also lower reflectivity loss was accomplished with minimal increase in the surface roughness.

• 2012-09-25

著者

• Kim Min-su

  Department Of Large Animal Clinical Sciences College Of Veterinary Medicine University Of Florida

• Ahn Jin-ho

  Department Of Electronic Engineering Hoseo University

• Lee Seung-ho

  Department Of Companion And Laboratory Animal Science Kongju National University

• Cho Han-ku

  Division of Memory, Samsung Electronics, Hwasung, Gyeonggi 445-701, Korea

• Ahn Jin-ho

  Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea

• Lee Han-shin

  Division of Memory, Samsung Electronics, Hwasung, Gyeonggi 445-701, Korea

• Kim Min-su

  Department of Materials Engineering, Hanyang University, Ansan, Gyeonggi 426-791, Korea

• Kang Bong-kyun

  Department of Materials Engineering, Hanyang University, Ansan, Gyeonggi 426-791, Korea

• Lee Seung-ho

  Department of Materials Engineering, Hanyang University, Ansan, Gyeonggi 426-791, Korea

• Park Jin-Goo

  Department of Bio-Nano Technology and Micro Biochip Center, Hanyang University, Ansan 426-791, Korea

• Park Jin-Goo

  Department of Materials Engineering, Hanyang University, Ansan, Gyeonggi 426-791, Korea

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