Hybrid Cleaning Technology for Enhanced Post-Cu/Low-Dielectric Constant Chemical Mechanical Planarization Cleaning Performance (Special Issue : Advanced Metallization for ULSI Applications)
スポンサーリンク
概要
著者
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Park Jin-Goo
Department of Bio-Nano Technology and Micro Biochip Center, Hanyang University, Ansan 426-791, Korea
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Cho Byoung-Jun
Bio-Nano Technology, Hanyang University, Ansan, Gyeonggi 426-791, Korea
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Park Jin-Goo
Department of Materials Engineering, Ansan, Gyeonggi 426-791, Korea
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Ramachandran Manivannan
Department of Materials Engineering, Ansan, Gyeonggi 426-791, Korea
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Kwon Tae-Young
Department of Materials Engineering, Ansan, Gyeonggi 426-791, Korea
関連論文
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- Effect of a guard-ring on the leakage current in a Si-PIN x-ray detector for a single photon counting sensor (Silicon devices and materials: 第15回先端半導体デバイスの基礎と応用に関するアジア・太平洋ワークショップ(AWAD2007))
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- Effect of Corrosion Inhibitor, Benzotriazole, in Cu Slurry on Cu Polishing
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- Hybrid Cleaning Technology for Enhanced Post-Cu/Low-Dielectric Constant Chemical Mechanical Planarization Cleaning Performance (Special Issue : Advanced Metallization for ULSI Applications)