Micropatterning of Ferroelectric Thin Films by Electron-Beam-Induced Reaction Process
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概要
- 論文の詳細を見る
The micropatterning of ferroelectric thin films is a valuable technology for realizing high-density ferroelectric random access memories, sensors and actuators. We fabricated 500-nm- to 20-μm-sized circular dots of (Pb,Sr)TiO3 micropatterns by an electron-beam-induced reaction process using a scanning-electron-microscope-based electron beam lithography system. The piezoelectric response was observed in 10-μm-sized dots by piezoresponse scanning force microscopy. Using an atomic force microscope, every fabricated dot pattern was found to have a mesa shape. To obtain 100-nm-sized dots with high density, further optimization of EB irradiation and crystallization conditions is necessary.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2008-01-25
著者
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Matsunaga Hiroaki
Department Of Clinical Laboratory Medicine Jichi Medical University
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Adachi Masatoshi
Department Of Chemistry And Biotechnology Graduate School Of Engineering Tottori University
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Fujii Tadashi
Department Of Botany Faculty Of Science Tokyo University Of Education
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Adachi Masatoshi
Department of Intelligent Systems Design Engineering, Toyama Prefectural University, 5180 Kurokawa, Imizu, Toyama 939-0398, Japan
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Fujii Tadashi
Department of Intelligent Systems Design Engineering, Toyama Prefectural University, 5180 Kurokawa, Imizu, Toyama 939-0398, Japan
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