414 ナノ粒子の大面積自己整列とエッチングマスク応用に関する研究(T03-3 マイクロナノ理工学:nmからmmまでのテクスチャリングの創成と機能(3),大会テーマセッション,21世紀地球環境革命の機械工学:人・マイクロナノ・エネルギー・環境)

概要

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Self-assembly of nano-particles has been applied to large-scale Si substrates and PET films. Dip coating technique successfully allows φ300nm-SiO_2 particles to be uniformly assembled on Si wafer of 100 millimeters diameter with small variations in the particles coverage. The suspension containing acrylic or polyester binder enables the particle coverage to be higher with the drawing speed, when the drawing speed is above specific value. It is estimated to be about 100 μm/s. It has been demonstrated that reactive ion etching selectively etches the opening among SiO_2 phrticles to fabricate nanostntctures onto Si surface. The morphology of etched surface has an army of pillars of several hundreds nanometers height with specific pitch according to the particle diameter. The φ110nm SiO_2 particles are also assembled on PET films. The effective index of refraction is approximately 1.22 in the assembled particles, so that it increases the transmittance of PET film.
社団法人日本機械学会の論文
2008-08-02