低エネルギーイオン支援によるスパッタ薄膜の高性能化

概要

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A method of improving mechanical properties of thin films by low energy ion irradiation treatment after the deposition was proposed in this study. The low energy Ar ion irradiation treatment is applied to aluminum thin films, which are widely applied to the MEMS and semiconductor device as conductive layers. Experimental results show that mechanical properties of the Al thin film deposited improved remarkably after the treatment. The surface of the Al thin films were irradiated with low energy Ar ions using Kaufman type ion gun for 30 minutes under the conditions: base pressure 1 × 10^-4 Pa, irradiation angle 90 degrees, acceleration voltagd 50 V and current density 0.1 mA/cm^2. The improvement is interpreted that Al atoms on the surface of the films were migrated due to kinetic energy of Ar ion irradiations and as the result: the bond strength in a direction of lengthwise was reinforced at the surface of Al films. The proposed treatment method is expected to improve surface mechanical properties of metal thin films deposited by various formation techniques and conditions, using selected irradiation treatment.
一般社団法人日本機械学会の論文
2002-02-25