低エネルギーイオン照射による金属薄膜性状に与える影響

概要

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A method of improving mechanical properties of Al thin films by low energy ion irradiation treatment after the deposition was proposed in this study. The surface of the Al thin films deposited on the glass substrate was irradiated with low energy Ar ions for 30 minutes, ion acceleration voltage 50V and 100V, ion current density was changed from 0.15 to 0.4mA/cm^2. Young modulus and hardness of Al thin film were increased, spacing of lattice planes d was decreased and peak intensity of Al (111) was increased after the irradiation. It is found that the improvement of mechanical properties of the Al films and increasing of peak intensity of Al (111) is related. Moreover it turns out that the irradiation effect of the ion acceleration voltage 50V compared with 100V is more remarkable. The proposed treatment method is expected to improve surface mechanical properties of metal thin films deposited by various formation techniques.
一般社団法人日本機械学会の論文
2005-01-25