2406 低エネルギーイオン照射による金属薄膜の機械特性の改善(J22-2 材料特性計測とマイクロ機構,J22 マイクロメカトロニクス,2005年度年次大会)

概要

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A method of improving mechanical properties of Nickel (Ni) thin films was proposed in this study. Ni thin films were electroplated on the Silicon (Si) substrate. The film with which some kinds of film thickness differs was formed, and it investigated about the difference in the influence of low energy Ar ion irradiation. Irradiation conditions were Ar ion acceleration voltage 30 V, ion current density 0.15mA/cm^2 and irradiation time 10 minutes. Young modulus of Ni thin film which was electroplating time is 5 min were increased by the irradiation, but Ni thin film which was electroplating time is 20 min is not increased. It is found that the irradiation effect changes with crystalline state of film before the irradiation.
一般社団法人日本機械学会の論文
2005-09-18