ガスフロースパッタ法により作製したCo-Pt/Pt薄膜の微細構造とアニールの効果

概要

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The microstructures of Co_<75>Pt_<25> (30nm)/Pt (200nm) films prepared by gas flow sputtering and the effects of annealing on their magnetic properties were studied. Transmission electron microscopy (TEM) of cross-sectional samples showed that the Co-Pt films consisted of columnar crystal grains with very distinct grain boundaries, and that the diameter of the crystal grain was about 10nm. It also showed that each Co-Pt grain was of hcp structure and that the grains were oriented with their c-axis along the direction perpendicular to the film plane. The coercivity of as-deposited films was about 4 kOe and was increased to 7 kOe by annealing at 250℃ in Ar, while the hep structure was unchanged up to 300℃. These results suggest that the annealing brings about oxidation, mainly of the grain boundaries, and magnetical isolation of the grains, resulting in an increase in coercivity.
社団法人日本磁気学会の論文
2006-07-01