ガスフロースパッタ法による高保磁力Co-Pt薄膜の作製(磁気記録)

概要

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Co-Pt thin films were prepared on glass substrates by gas flow sputtering (GFS), and the relationship between the magnetic properties and film structures was studied. GFS is a high pressure sputtering in the range of 100 Pa, which enables low-temperature and soft film growth to occur. It was found that the coercivity of Co-Pt films with a thickness of 30 nm increased with increasing Pt content and took a high value of over 4 kOe at Pt contents of about 20 at%, and also found that films with Pt contents less than 30 at% were of hep structure and composed of small grains about 5 nm in diameter. A high coercivity observed in these films was assumed to be due to their grain structure, consisting of small hep-Co-Pt crystallites surrounded by more oxidized boundaries.
社団法人日本磁気学会の論文
2004-04-01