Effect of Ar^+ Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-11-15
著者
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NAKANO Yuuki
Department of Pharmacology, School of Pharmaceutical Sciences, Showa University
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KATO Isamu
Department of Electronics, Information and Communication Engineering, Waseda University
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YAMAGUCHI Nobuhiko
Department of Electronics, Information and Communication Engineering, Waseda University
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Kato Isamu
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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Nakano Yuuki
Department Of Electronics Information And Communication Engineering Waseda University
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Yamaguchi Naohiro
Toyota Technological Institue
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Yamaguchi Nobuhiko
Department Of Electronics Information And Communication Engineering Waseda University
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