Microwave Plasma CVD System for the Fabrication of Thin Solid Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1982-08-20
著者
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KATO Isamu
Department of Electronics, Information and Communication Engineering, Waseda University
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Kato Isamu
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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HARA Shinji
Department of Information Physics and Computing, The University of Tokyo
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Kezuka Hiroshi
College Of Engineering Hosei University:(present Address) Department Of Electrical Engineering Unive
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Kezuka Hiroshi
College Of Engineering Hosei University
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Hara Shinji
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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WAKANA Shin-ichi
Department of Electronics and Communication Engineering, School of Science and Engineering, Waseda U
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Kato Isamu
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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Wakana Shin-ichi
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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- Optical Energy Gap Measuremerut of Plasma Chemical Vapor Deposition Very Thin Films Using Evanescent Wave
- Dependence of Photoluminescence Characteristics of Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films on Ion Bombardment Energy
- Photoluminescence from Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films Fabricated by Double-Tubed-Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition System : Optics and Quantum Electronics
- Effect of HF Treatment on Photoluminescence Characteristics of a-Si:H Nanoball Films
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