Fabrication of a-Si:H Thin Films Using a Microwave Discharge Under a Magnetic Field of Electron Cyclotron Resonance
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概要
- 論文の詳細を見る
We have fabricated a-Si:H thin films using a microwave discharge under a magnetic field of electron cyclotron resonance (ECR). The films fabricated in ECR plasma are predominantly Si-H bonded because of high-energy plasma particle bombardment. The films fabricated on glass substrates, however, peel off easily because of the difference in the coefficient of heat expansion between the film and the substrate. The films fabricated out of ECR plasma are not subjected to the bombardment and are mainly Si-H_2 bonded. These films do not peel off even when deposited on glass substrate and are of high quality.
- 社団法人応用物理学会の論文
- 1989-03-20
著者
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Kato Isamu
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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Kato Kiyotaka
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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Kato Isamu
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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Kato Kiyotaka
Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni
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