Optical Energy Gap Measurement of Semiconductor Ultrathin Films Using Optical Waveguides

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-05-15

著者

• KATO Isamu

  Department of Electronics, Information and Communication Engineering, Waseda University

• TAKEZAWA Naganori

  Department of Electronics and Communication, School of Science and Engineering, Waseda University

• Takezawa Naganori

  Department Of Electronics And Communication School Of Science And Engineering Waseda University

• Kato Isamu

  Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni

• Takezawa N

  Waseda Univ. Tokyo Jpn

関連論文

• Effect of Ar^+ Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System
• Refractive Index Measurement of Silicon Thin Films Using Stab Optical Waveguides
• Optical Energy Gap Measurement of Semiconductor Ultrathin Films Using Optical Waveguides
• Oxidation Properties of Silicon Nitride Thin Films Fabricated by Double Tubed Coaxial Line Type Microwave Plasma Chemical Vapor Deposition : Surfaces, Interfaces and Films
• Microwave Plasma CVD System for the Fabrication of Thin Solid Films
• Method of Probe Measurement in N_2/SiH_4 Microwave Plasma
• Microwave Plasma CVD System to Fabricate α-Si Thin Films out of Plasma
• Deposition of Hydrogenated Amorphous Silicon Films Using a Microwave Plasma Chemical Vapor Deposition Method with DC Bias
• Fabrication of a-Si:H Thin Films Using a Microwave Discharge Under a Magnetic Field of Electron Cyclotron Resonance
• Removal Conditions of Films Deposited on Probe Surface
• Optical Energy Gap Measuremerut of Plasma Chemical Vapor Deposition Very Thin Films Using Evanescent Wave
• Dependence of Photoluminescence Characteristics of Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films on Ion Bombardment Energy
• Photoluminescence from Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films Fabricated by Double-Tubed-Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition System : Optics and Quantum Electronics
• Effect of HF Treatment on Photoluminescence Characteristics of a-Si:H Nanoball Films
• Refractive Index Measurement of Silicon Thin Films Using Slab Optical Waveguides

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