Effect of HF Treatment on Photoluminescence Characteristics of a-Si:H Nanoball Films

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概要

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• We perform HF treatment to a-Si:H nanoball films fabricated by the double-tubed coaxial-line-type microwave plasma chemical vapor deposition (MPCVD) system. By HF treatment, Photoluminescence wavelength shifted from 760 nm to 590 nm. We have determined the diameter of Si nanocrystals by X-ray diffraction (XRD) and transmission electron microscopy (TEM). It is found that the diameter of Si nanocrystals decreases from 5 nm to 3.7 nm, by HF treatment.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 2004-11-15

著者

• Kato Isamu

  Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni

• Suzuki Fumiaki

  Department Of Animal Science And Technology Faculty Of Agriculture Gifu University

• Suzuki Fumiaki

  Department Of Electronics Information And Communication Engineering Waseda University

• Kato Isamu

  Department Of Electronics Information And Communication Engineering Waseda University

• Motoyama Yosuke

  Department of Electronics, Information and Communication Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan

• Motoyama Yosuke

  Department Of Electronics Information And Communication Engineering Waseda University

• SUZUKI Fumiaki

  Department of Agricultural Chemistry, Faculty of Agriculture, Gifu University

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