Nanostructure fabrication using selective growth on nanosize patterns drawn by a scanning probe microscope
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概要
- 論文の詳細を見る
A novel method of fabricating organic material nanostructures using selective growth on patterned layered material surfaces has been developed. First, an epitaxial monolayer film of layered semiconductor GaSe was gown on a cleaved face of MoS2. Then, nanosize patterns were drawn by scratching only the grown GaSe film using an atomic force microscope (AFM). Next, C-60 molecules were deposited on the surface. It has been found that if a substrate temperature is appropriately chosen, C-60 molecules nucleate only on the bare MoS2 surface and fill up the carved nanostructures. This combination of AFM lithography and selective growth enables the formation of C-60 nanostructures as small as 10 nm.
- 社団法人応用物理学会の論文
- 1997-06-30
著者
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UENO Keiji
Department of Chemistry, Faculty of Engineering, Gunma University
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上野 啓司
埼玉大理
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KOMA Atsushi
Department of Chemistry, The University of Tokyo
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SASAKI Kentaro
Department of Chemistry, The University of Tokyo
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