Anomalous Defect Processes in Silicon-Implanted SiO_2

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-07-20

著者

• FUKUI Minoru

  Nakanihon Automotive College

• Fujita Tetsuo

  Department Of Physics Nagoya University

• Itoh N

  Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch

• Fujita Tetsuo

  Department Of Physics Faculty Of Science Nagoya University

• ITOH Noriaki

  Department of Physics, Faculty of Science, Nagoya University

• OKADA Shunji

  Nakanihon Automotive College

• SHIMIZU Tsutomu

  Department of Physics, Faculty of Science, Nagoya University

• Fujita T

  Department Of Physics Faculty Of Science Nagoya University

• Fukui Masuo

  Department Of Electrical And Electronic Engineering Tokushima University

• Fujita Tetsuo

  Department Of Electronic Engineering Shizuoka Institute Of Science And Technology

• Itoh N

  National Aerospace Lab. Tokyo

• Itoh Noriaki

  Department Of Crystalline Materials Science Faculty Of Engineering Nagoya University

• Fujita T

  Hiroshima Univ. Hiroshima Jpn

• Itoh Noriaki

  Department Of Crystalline Material Science Faculty Of Engineering Nagoya University

• Shimizu Tsutomu

  Department Of Physics Faculty Of Science Nagoya University

• Itoh Noriaki

  Department of Physics,Faculty of Science,Nagoya University

• Fujita Tetsuo

  Department of Applied Chemistry, Faculty of Engineering, Osaka University

• Shimizu Tsutomu

  Department of Cardiovascular Medicine, Graduate School of Medicine, University of Tokyo

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