SiO_2 Film Growth from ArF Laser Photolysis of Si_2H_6 and N_2O in a Perpendicular Irradiation Configuration

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-01-15

著者

• Tsuji Masaharu

  Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch

• 辻 正治

  九州大学先導物質化学研究所

• Tsuji Masaharu

  Institute For Materials Chemistry And Engineering Kyushu University

• Tsuji M

  Matsushita Battery Industrial Co. Ltd. Osaka Jpn

• Itoh N

  Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch

• NISHIMURA Yukio

  Institute of Advanced Material Study, Kyushu University

• Nishimura Y

  Kyushu Univ. Fukuoka Jpn

• Nishimura Yukio

  Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch

• Ito Noriko

  Department Of Chemistry Nagaoka University Of Technology

• ITOH Naoki

  Institute of Advanced Material Study and Department of Molecular Science and Technology, Graduate Sc

• Itoh Naoki

  Department Of Biology Faculty Of Science Okayama University

• Nishimura Yukio

  Institute Of Acvanced Material Study And Department Of Molecular Science And Technology Graduate Sch

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