Enhancement of Etch Rate by the Addition of O_2 and Ar in Chemical Dry Etching of Si Using a Discharge Flow of Ar/CF_4 and CF_4/O_2 Gas Mixtures
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-04-01
著者
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TANAKA Atsushi
Department of Quantum Science and Energy Engineering, Tohoku University
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辻 正治
九州大学
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Tsuji Masaharu
Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch
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辻 正治
九州大学先導物質化学研究所
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Tsuji Masaharu
Institute For Materials Chemistry And Engineering Kyushu University
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Tsuji M
Matsushita Battery Industrial Co. Ltd. Osaka Jpn
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Okano Shinji
Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Science
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NISHIMURA Yukio
Institute of Advanced Material Study, Kyushu University
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Nishimura Y
Institute Of Advanced Material Study Kyushu University
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Tanaka Atsushi
Department Of Cardiovascular Medicine Wakayama Medical University
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Nishimura Yukio
Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch
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Tanaka A
Division Of Pediatrics Department Of Homeostatic Regulation And Development Niigata University Gradu
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Tanaka A
Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Science
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Nishimura Yukio
Institute Of Acvanced Material Study And Department Of Molecular Science And Technology Graduate Sch
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Tanaka Atsushi
Department Of Cardiology Kariya Toyota General Hospital
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