溶液中レーザーアブレーションによる新規ナノ材料の創製(平成13年度 機能研所長リーダーシップ経費(若手奨励研究)による研究の紹介)

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概要

• 論文の詳細を見る

• 平成13年度機能研所長リーダーシップ経費(若手奨励研究)による研究の紹介

• 九州大学の論文

著者

• 辻 剛志

  九大先導研・crest

• Tanoue T

  Kyushu Univ. Fukuoka

• 辻 正治

  九州大学

• Tsuji Masaharu

  Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch

• 辻 正治

  九州大学先導物質化学研究所

• Tsuji Masaharu

  Crest Jst

• 辻 剛志

  九州大学 機能物質科学研究所

• Tsuji M

  Matsushita Battery Industrial Co. Ltd. Osaka Jpn

• Tsuji Takeshi

  Crest Jst

• 辻 剛志

  九州大学・機能研

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• シリコン表面窒化用活性窒素フロー装置の開発
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• Formation of CO(d^3Δ_i, a'^3Σ^+) by Dissociative Ion-Ion Neutralization Reaction
• Formation of the He_(c, d, e, f, C, D, E, F) States by Ion-Ion Neutralization Reaction of He_2^1 with C_6F_6^- in the Helium Flowing Afterglow
• Dissociative Excitation of CH_4 via Triplet Superexcited State by Collisions with the Metastable Ne(^3P_)Atoms in a Neon Flowing Afterglow
• Formation of the He(3s, 3p, 3d)States by Ion-Ion Neutralization Reaction of He^+ with C_6F_6^- in the Helium Flowing Afterglow
• Emission Spectum of NeAr_2^+ Cluster Ion Produced in the Flowing Afterglow
• Formation of High Rydberg He (np ^3P : n=5-12) Atoms by the Three-Body Collisional-Radiative Recombination of He^+ in the Helium Flowing Afterglow
• SiCl_4^+(C^2T_2-X^2T_1, C^2T_2-A^2T_2) Emissions Produced from the He(2^3S), Ne(^3P_)/SiCl_4 Penning Ionization and Ar^+(^2P_)/SiCl_4 Charge-Transfer Reaction at Thermal Energy
• Emission Spectra of HeAr_n^+(n=1-3) Cluster Ions Produced from the Helium Afterglow Reactions of Ar
• Mass-Spectrometric Study on Ion-Molecule Reactions of CF^+_3 with Propyne, Allene, and 1-Butyne at Near-Thermal Energies
• Chemical Ionization Mass Spectra of Benzene and Toluene at Low CH_4 Pressures
• Mass-Spectrometric Study on Ion-Molecule Reactions of CF_3^+ with PhX (X = F, Cl, Br, I) at Near-Thermal Energies
• A Chemical Dry Etching of Si and SiO_2 Substrates by F atoms in a Discharge Flow
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• 溶液中レーザーアブレーションによる新規ナノ材料の創製(平成13年度 機能研所長リーダーシップ経費(若手奨励研究)による研究の紹介)
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