A Chemical Dry Etching of Si and SiO_2 Substrates by F atoms in a Discharge Flow
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-11-15
著者
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Tsuji Masaharu
Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch
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Tsuji Masaharu
Institute For Materials Chemistry And Engineering Kyushu University
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NISHIMURA Yukio
Institute of Advanced Material Study, Kyushu University
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Tsuji Masaharu
Institute Of Advanced Material Study Kyushu University
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Nishimura Yukio
Institute Of Advanced Material Study Kyushu University
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Nishimura Yukio
Institute Of Advanced Material Study And Department Of Molecular Science And Technology Graduate Sch
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Nishimura Yukio
Institute Of Acvanced Material Study And Department Of Molecular Science And Technology Graduate Sch
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Tsuji Masaharu
Institute of Advanced Material Study, Kyushu University
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