Photochemical Removal of SO2 and CO2 by 172 nm Xe2 and 146 nm Kr2 Excimer Lamps in N2 or Air at Atmospheric Pressure
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概要
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The photochemical removal of SO2 and CO2 was investigated in N2 or air using 172 nm Xe2 (50 or 300 mW/cm2) and 146 nm Kr2 (25 mW/cm2) excimer lamps and without using any expensive catalysts. After 30 min photoirradiation, 45 and 75% of SO2 (1000 ppm) were removed in N2 and air (20% O2) at 172 nm photoirradiation, respectively, whereas 39 and 8% of SO2 were removed in N2 and air at 146 nm, respectively. By using a high-power Xe2 lamp, ${\sim}10$ and ${\sim}45$% of SO2 (200 ppm) could be removed in N2 and air in a flow system, respectively. Although no photolysis of CO2 (1000 ppm) was observed at 172 nm, ${\sim}16$ and ${\sim}8$% of CO2 were converted to $\text{CO}+\text{O$_{2}$}$ in N2 and air at 146 nm after about 10 min photoirradiation, respectively. Possible decomposition mechanisms were discussed.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-12-25
著者
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Tsuji Masaharu
Institute For Materials Chemistry And Engineering Kyushu University
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HISHINUMA Nobuyuki
USHIO Inc.
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Kawahara Takashi
Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Sciences
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Kamo Naohiro
Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Sciences
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Kawahara Masashi
Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Sciences
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