Efficient Photochemical Conversion of N_2O into N_2 and O_2 by 193-nm-ArF-excimer Laser in N_2 or Air at Atmospheric Pressure

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概要

• 論文の詳細を見る
• 2005-06-05

著者

• 辻 剛志

  九大先導研・crest

• Tanoue T

  Kyushu Univ. Fukuoka

• 辻 正治

  九州大学先導物質化学研究所

• Tsuji Masaharu

  Crest Jst

• 辻 剛志

  九州大学 機能物質科学研究所

• Tsuji Takeshi

  Crest Jst

• NODA Kenji

  Department of Electronic Engineering, Faculty of Engineering, Osaka University

• TSUJI Masaharu

  JST

• SAKO Hiroshi

  Department of Applied Science for Electronics and Materials, Graduate School of Engineering Sciences

• SENDA Makoto

  Department of Applied Science for Electronics and Materials, Graduate School of Engineering Sciences

• HAMAGAMI Taro

  Institute for Materials Chemistry and Engineering, Kyushu University

• TSUJI Takeshi

  JST

• 辻 剛志

  九州大学・機能研

• Senda Makoto

  Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Sciences

• Sako Hiroshi

  Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Sciences

• Hamagami Taro

  Institute For Materials Chemistry And Engineering Kyushu University

• Noda Kenji

  Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Sciences

• Senda Makoto

  Institute For Materials Chemistry And Engineering Kyushu University

• Noda Kenji

  Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Sciences

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