Fine Patterns of Positive-Working Resists Using a Polyimide Langmuir-Blodgett Film System
スポンサーリンク
概要
- 論文の詳細を見る
Thermally stable multilayer films polyimide containting photosensitive disilane unit were applied to KrF excimer laser resists. The multilayer films prepared by the Langmuir-Blodgett technique were found to act as positive working resists with a resolution of 0.25 μm lines and spaces.
- 社団法人応用物理学会の論文
- 1991-02-01
著者
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IMAI Yoshio
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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IWAMOTO Mitsumasa
Department of Physical Electronics, Tokyo Institute of Technology
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NISHIKATA Yasunari
Department of Organic and Pholymeric Materials, Tokyo Institute of Technology
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IRIYAMA Keiji
Division of Biochemistry, Institute of Medical Science, The Jikei University
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Imai Y
Ntional Institute Of Advanced Industrial Science And Technology
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Iriyama Keiji
Division Of Biochemistry Central Research Laboratory Jikei University School Of Medicine
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Iriyama Keiji
Division Of Biochemistry Institute Of Medical Science The Jikei University School Of Medicine
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Iwamoto Mitsumasa
Department Of Electrical And Electronic Engineering
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Kasahara Shigeo
Basic Process Development Division Fujitsu Ltd.
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Kakimoto Masaaki
Department of Organic and Polymeric Materials, Tokyo Institute of Techonology
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Nishikata Yasunari
Department Of Organic And Polymeric Materials Tokyo Institute Of Techonology
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Kakimoto Masaaki
Osaka R&d Laboratories Sumitomo Electric Industries Ltd.
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Imai Yoshio
Department Of Oral Functional Science Graduate School Of Dental Medicine Hokkaido University
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