Low-Temperature Epitaxy of GaAs by Metalorganic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
The low-temperature (LT) epitaxial growth of high quality GaAs films is achieved by using triethylgallium and tertiarybutylarsine as the precursors. Without any external work, the deposition chart be conducted at a temperature as low as 350℃ in a conventional metalorganic chemical vapor deposition system. The full width at half-maximum of 77 K photoluminescenoe and X-ray rocking curve for a sample grown at 425℃ are 8.2 meV and 14 arcsec, respectively. Materials with good electrical properties were also obtained. A Schottky diode formed on the LT CaAs epilayer shows a barrier height of 0.83 eV, and a reverse saturation current of 1.1×10^<-7> A/cm^2, comparable to that of a normal GaAs Schottky diode.
- 社団法人応用物理学会の論文
- 1994-08-01
著者
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CHEN Wei-Kuo
Department of Electrophysics, National Chiao Tung University
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CHANG Chen-Shiung
Institute of Electro-Optical Engineering, National Chiao Tung Universityd
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Chang Chen-shiung
Institute Of Electro-optical Engineering National Chiao Tung University
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Chang Chen-shiung
Institute Of Electro-optics Chiao-tung University
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Chen Wei-kuo
Department Of Electrophysics Chiao-tung University
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CHEN Wen-Chun
Institute of Electro-optics, Chiao-Tung University
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