Properties of Highly Resistive and Nonstoichiometric GaAs Film Grown by Low-temperature Metalorganic Chemical Vapor Deposition Using Tertiarybutylarsine
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-06-01
著者
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CHEN Wei-Kuo
Department of Electrophysics, National Chiao Tung University
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Chang C.-s.
Institute Of Electro-optical Engineering National Chiao Tang University
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Chang C.-s.
Institute Of Electro-optical Engineering National Chiao Tung University
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CHEN Wen-Chung
Institute of Electro-Optical Engineering, National Chiao Tung University
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Chang C‐s
Acad. Sinica Taipei Twn
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Chen W‐c
National Cheng Kung Univ. Tainan Twn
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Chen Wen-chung
Institute Of Electro-optical Engineering National Chiao Tang University
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Chen Wei-kuo
Department Of Electrophysics Chiao-tung University
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- Properties of Highly Resistive and Nonstoichiometric GaAs Film Grown by Low-temperature Metalorganic Chemical Vapor Deposition Using Tertiarybutylarsine
- The Dynamics of Thermal Annealing in Arsenic-Ion-Implanted GaAs
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- Electrical Properties of the Free-Standing Diamond Film at High Voltages
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