Influence of Halogen plasma Atmosphere on SiO_2 Etching Characteristics : Etching
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-30
著者
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Teraoka Yuden
Opto-electronics Research Labs. Nec Corp.
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IKAWA Eiji
Microelectronics Research Labs., NEC Corp.
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KIKKAWA Takamaro
Microelectronics Research Labs., NEC Corp.
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NISHIYAMA Iwao
Opto-electronics Research Labs., NEC Corp.
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TOKASHIKI Ken
Microelectronics Research Labs, NEC Corp.
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HASHIMOTO Toshiki
Microelectronics Research Labs, NEC Corp.
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HASHIMOTO Tatsunori
Department of Electronics, Kyushu University
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Nishiyama Iwao
Opto-electronics Research Labs. Nec Corp.
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Nishiyama Iwao
Graduate School Of Agriculture Tohoku University
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Kikkawa Takamaro
Microelectronics Research Laboratories Nec Corporation
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Hashimoto T
Department Of Chemistry For Materials Faculty Of Engineering Mie University
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Ikawa E
Ulsi Device Development Labs. Nec Corporation
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Ikawa Eiji
Microelectronics Research Laboratories Nec Corporation
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Tokashiki K
Nec Corp. Kanagawa Jpn
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Nishiyama I
Tohoku Univ. Sendai Jpn
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Hashimoto Tadanori
Department Of Chemistry For Materials Faculty Of Engineering Mie University
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Nishiyama Iwao
Opto-electronics Research Laboratories Nec Corporation
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