Quarter-Micron Interconnection Technologies for 256-Mbit Dynamic Random Access Memories
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-30
著者
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Aoki Hiroaki
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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AOKI Hidemitsu
Microelectronics Research Labs., NEC Corp.
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KIKKAWA Takamaro
Microelectronics Research Labs., NEC Corp.
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Kikkawa Takamaro
Microelectronics Research Laboratories Nec Corporation
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Aoki H
Tokyo Inst. Technol. Tokyo Jpn
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KIKUTA Kuniko
Microelectronics Research Laboratories, NEC Corporation
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TSUNENARI Kinji
Microelectronics Research Laboratories, NEC Corporation
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OHTO Koichi
Microelectronics Research Laboratories, NEC Corporation
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DRYNAN John
Microelectronics Research Laboratories, NEC Corporation
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KASAI Naoki
Microelectronics Research Laboratories, NEC Corporation
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KUNIO Takemitsu
Microelectronics Research Laboratories, NEC Corporation
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Kikuta Kuniko
Ulsi Device Development Laboratories Nec Corporation
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Kasai N
Aist Ibaraki Jpn
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Drynan John
Microelectronics Research Laboratories Nec Corporation
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Ohto Koichi
Microelectronics Research Laboratories Nec Corporation
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Kunio Takemitsu
Microelectronics Research Laboratories Nec Corporation
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Tsunenari Kinji
Microelectronics Research Laboratories Nec Corporation
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Kasai Naoki
Microelectronics Research Laboratories Nec Corporation
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Kunio Takemitsu
Microelectronics Research Laboratories Nec
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AOKI Hidemitsu
Microelectronics Research Laboratories, NEC Corporation
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- Ultrafine-Particle Beam Deposition II: Mechanism of Film Formation
- Ultrafine Particle Beam Deposition I. Sampling and Transportation Methods for Ultrafine Particles
- Study of Submicron SrTiO_3 Patterning
- Quarter-Micron Interconnection Technologies for 256-Mbit Dynamic Random Access Memories
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