Dependence of Residual Chlorine Amount on Al Grain Size
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-06-30
著者
-
Teraoka Yuden
Opto-electronics Research Labs. Nec Corp.
-
Aoki Hiroaki
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
-
AOKI Hidemitsu
Microelectronics Research Labs., NEC Corp.
-
IKAWA Eiji
Microelectronics Research Labs., NEC Corp.
-
KIKKAWA Takamaro
Microelectronics Research Labs., NEC Corp.
-
NISHIYAMA Iwao
Opto-electronics Research Labs., NEC Corp.
-
Nishiyama Iwao
Opto-electronics Research Labs. Nec Corp.
-
Nishiyama Iwao
Graduate School Of Agriculture Tohoku University
-
Kikkawa Takamaro
Microelectronics Research Laboratories Nec Corporation
-
Aoki H
Tokyo Inst. Technol. Tokyo Jpn
-
Ikawa E
Ulsi Device Development Labs. Nec Corporation
-
Ikawa Eiji
Microelectronics Research Laboratories Nec Corporation
-
Nishiyama I
Tohoku Univ. Sendai Jpn
-
Nishiyama Iwao
Opto-electronics Research Laboratories Nec Corporation
-
AOKI Hidemitsu
Microelectronics Research Laboratories, NEC Corporation
関連論文
- Dependence of Residual Chlorine Amount on Al Grain Size
- Influence of Halogen plasma Atmosphere on SiO_2 Etching Characteristics : Etching
- Influence of Halogen Plasma Atmosphere on SiO_2 Etching Characteristics
- After-Corrosion Suppression Using Low-Temperature Al-Si-Cu Etching
- STUDY OF HIGH TEMPERATURE EFFECTS AND CONSTRUCTION OF MOLECULAR MARKERS ON REPRODUCTIVEGROWTHIN BARLEYPLANT
- Effects of High Temperature on the Development of Pollen Mother Cells and Microspores in Barley Hordeum vulgare L.
- Ultrafine-Particle Beam Deposition III: Applications to Thermoelectric Materials
- Ultrafine-Particle Beam Deposition II: Mechanism of Film Formation
- Ultrafine Particle Beam Deposition I. Sampling and Transportation Methods for Ultrafine Particles
- Study of Submicron SrTiO_3 Patterning
- Quarter-Micron Interconnection Technologies for 256-Mbit Dynamic Random Access Memories
- Low-Temperature Etching of 0.2 μm Al Patterns Using a Sio_2 Mask
- A Capacitor over Bit-Line (COB) Stacked Capacitor Cell Using Local Interconnect Layer for 64 MbDRAMs
- 0.15μm CMOS Devices with Reduced Junction Capacitance
- Number of Pollen Grains in Rice Cultivars with Different Cool-Weather Resistance at the Young Microspore Stage
- Secondary Ion Analysis of Silicon under Ar^+ Ion Etching in Chlorine and Fluorine Flux
- Synchrotron Radiation Induced Direct Projection Patterning of Aluminum on Si and SiO_2 Surfaces (Special Issue on Opto-Electronics and LSI)
- Photoinduced Destruction of Polar Structure in Dye-Pendant Polymers Studied by Second-Harmonic Generation