Sputtering Conditions and Properties of In-Plane-Aligned Y-Ba-Cu-O Films for Devices Application(<Special Section>Recent Progress in Oxide Thin Films by Sputtering)

概要

論文の詳細を見る
In-plane-aligned a-axis-oriented YBa_2Cu_3O_<7_δ> (YBCO) thin films are attractive for the formation of planar intrinsic Josephson devices. In this study, these films were deposited by dc sputtering on LaSrGaO_4 (LSGO) (100) substrates and the dependence of the characteristics on the deposition conditions was investigated. In-plane-aligned a-axis-oriented YBCO thin films were successfully grown in the substrate temperature range of 555-615℃. With the temperature gradient method, it was seen that the critical temperature of the film increased to 81 K. The current-voltage characteristic along the c-axis exhibited clear multibranch structures. These results indicate that ion-cleaning of the substrate surface broadens the growth temperature range of these films and planar intrinsic Josephson devices can be fabricated from these films.
社団法人電子情報通信学会の論文
2004-02-01