Improvement of Charge Retention in Flash Memory Devices by Very Light Doping of Lanthanum into an Aluminum-Oxide Blocking Layer
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概要
- 論文の詳細を見る
- 2012-08-25
著者
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OH Jae
National Nanofab Center
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CHO Byung
Department of Electrical Engineering, KAIST
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Cho Byung
Department Of Eecs Kaist
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Park Jong
Department Mathematics Pusan National University
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LEE Seok-Hee
Department of Electrical Engineering, KAIST
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LEE Ki-Hong
Hynix Semiconductor Inc.
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PYI Seung
Hynix Semiconductor Inc.
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PARK Jong
Department of Electrical Engineering, KAIST
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