Investigation of Reliability Degradation of Ultra-Thin Gate Oxides Irradiated under Electron-Beam Lithography Conditions
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-04-30
著者
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Yeo I
Hyundai Electronics Ind. Co. Ltd. Kyungki‐do Kor
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Yeo In
Hyundai Electronics Industries Company Limited Semiconductor Advanced Research Division
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Cho B
National Univ. Singapore Sgp
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Cho Byung
Department Of Eecs Kaist
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Cho Byung
Department Of Electrical And Computer Engineering National University Of Singapore
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Joo Moon
Hyundai Electronics Industries Company Limited Semiconductor Advanced Research Division
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Chor E
National Univ. Singapore Singapore
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CHONG Pei
Department of Electrical Engineering, National University of Singapore
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CHOR Eng
Department of Electrical Engineering, National University of Singapore
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Chor Eng
Department Of Electrical Engineering National University Of Singapore
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Chong Pei
Department Of Electrical Engineering National University Of Singapore
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Chong Pei
Department Of Biomedical Sciences Faculty Of Medicine Health And Sciences University Putra Malaysia
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Joo Moon
Hyundai Electronics Industries Company Limited Memory R&d Division
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Yeo In
Hyundai Electronics Industries Company Limited Memory R&d Division
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JOO Moon
Hyundai Electronics Ind. Co. Ltd. Memory R&D Division
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YEO In
Hyundai Electronics Ind. Co. Ltd. Memory R&D Division
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