Dependence of Sub-Threshold Hump and RNWE Characteristics on the Gate Length by TED
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概要
- 論文の詳細を見る
- 1999-09-20
著者
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Kim J‐m
Department Of Manufacturing Science Graduate School Of Engineering Osaka University
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LEE Young-Jong
LG Semicon.,Ltd.
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Jung J‐w
Hanyang Univ. Seoul Kor
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Lee Kyung-ho
Lg Semicon Co. Ltd.
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Lee Y‐j
Samsung Electronics Co. Ltd. Kyunggi‐do Kor
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Kim Jong-min
Materials & Devices Lab. Samsung Advanced Institute Of Technology
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Kim Jong-min
Hyundai Electronics Industries Co. Ltd.
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Son Jeong-hwan
Hyundai Electronics Industries Co. Ltd.
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Lee Young-jong
Lg Semicon. Ltd.
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Lee Young-jong
Advanced Technology Laboratory Lg Semicon Co. Ltd.
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Jung Jong-wan
Hyundai Electronics Industries Co. Ltd.
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JUNG Jong-Wan
LG Semicon Co., Ltd.
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KIM Jong-Min
LG Semicon Co., Ltd.
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SON Jeong-Hwan
LG Semicon Co., Ltd.
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CHUNG Shin-Young
LG Semicon Co., Ltd.
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KIM Hyun-Cheol
LG Semicon Co., Ltd.
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Lee Young-jong
Advanced Technology Laboratory. Lg Semicon Co.
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Son J‐h
Hyundai Electronics Industries Co. Ltd.
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Kim Hyun-cheol
Lg Semicon Co. Ltd.
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Chung Shin-young
Lg Semicon Co. Ltd.
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