Impact of Hot Carrier Stress on Low-Frequency Noise Characteristics in Floating-Body SOI MOSFETs

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概要

• 論文の詳細を見る
• 2001-09-25

著者

• TSUCHIYA Toshiaki

  Interdisciplinary Faculty of Science and Engineering, Shimane University

• Yoshida Toshiyuki

  Interdisciplinary Faculty Of Science And Engineering Shimane University

• Sato Y

  Toshiba Corp. Kawasaki Jpn

• SATO Yasuhiro

  NTT Telecommunications Energy Laboratories

• Tsuchiya Toshiaki

  Interdisciplinary Faculty Of Science And Engineering Shimane University

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• Grain-Boundary Related Hot Carrier Degradation Mechanism in Low-Temperature Polycrystalline Silicon Thin-Film Transistors
• Impact of Hot Carrier Stress on Low-Frequency Noise Characteristics in Floating-Body Silicon-on-Insulator Metal Oxide Semiconductor Field-Effect Transistors
• Impact of Hot Carrier Stress on Low-Frequency Noise Characteristics in Floating-Body SOI MOSFETs
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