Novel Shallow Trench Isolation Process from Viewpoint of Total Strain Process Design for 45nm Node Devices and Beyond
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-04-30
著者
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Kuroi T
Ulsi Development Center Mitsubishi Electric Corporation
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KOBAYASHI Kiyoteru
Process Development Dept., Process Technology Development Div., Production and Technology Unit, Rene
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ISHIBASHI Masato
Process Technology Development Division, Renesas Technology Corp.
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HORITA Katsuyuki
Process Technology Development Division, Renesas Technology Corp.
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SAWADA Mahito
Process Technology Development Division, Renesas Technology Corp.
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KITAZAWA Masashi
Process Technology Development Division, Renesas Technology Corp.
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IGARASHI Motoshige
Process Technology Development Division, Renesas Technology Corp.
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KUROI Takashi
Process Technology Development Division, Renesas Technology Corp.
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EIMORI Takahisa
Process Technology Development Division, Renesas Technology Corp.
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INUISHI Masahide
Process Technology Development Division, Renesas Technology Corp.
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OHJI Yuzuru
Process Technology Development Division, Renesas Technology Corp.
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