KUROI Takashi | Process Technology Development Division, Renesas Technology Corp.
スポンサーリンク
概要
- Igarashi Motoshigeの詳細を見る
- 同名の論文著者
- Process Technology Development Division, Renesas Technology Corp.の論文著者
関連著者
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ISHIBASHI Masato
Process Technology Development Division, Renesas Technology Corp.
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HORITA Katsuyuki
Process Technology Development Division, Renesas Technology Corp.
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KUROI Takashi
Process Technology Development Division, Renesas Technology Corp.
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KITAZAWA Masashi
Process Technology Development Division, Renesas Technology Corp.
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IGARASHI Motoshige
Process Technology Development Division, Renesas Technology Corp.
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EIMORI Takahisa
Process Technology Development Division, Renesas Technology Corp.
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INUISHI Masahide
Process Technology Development Division, Renesas Technology Corp.
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Kuroi T
Ulsi Development Center Mitsubishi Electric Corporation
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KOBAYASHI Kiyoteru
Process Development Dept., Process Technology Development Div., Production and Technology Unit, Rene
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SAWADA Mahito
Process Technology Development Division, Renesas Technology Corp.
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OHJI Yuzuru
Process Technology Development Division, Renesas Technology Corp.
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Sawada Mahito
Process Development Department Process Technology Development Division Production And Technology Uni
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Umeda Hiroshi
Process Development Dept. Wafer Process Engineering Development Div. Lsi Manufacturing Unit Renesas
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Ohji Yuzuru
Process Technology Development Division Renesas Technology Corp.
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Yamashita Tomohiro
Process Technology Development Div. Renesas Technology Corp.
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Kobayashi Kiyoteru
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
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Inoue Yasuo
Process Technology Development Div. Renesas Technology Corp.
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Kawahara Takaaki
Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Eimori Takahisa
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Kawahara Takaaki
Process Technology Development Division, Renesas Technology Corp., Itami, Hyogo 664-0005, Japan
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Horiba Yasutaka
Department of Electrical Engineering and Computer Science, Faculty of Engineering, Kansai University, Suita, Osaka 564-8680, Japan
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Inoue Yasuo
Process Technology Development Division, Renesas Technology Corp., Itami, Hyogo 664-0005, Japan
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Ohji Yuzuru
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Yamashita Tomohiro
Process Technology Development Division, Renesas Technology Corp., Itami, Hyogo 664-0005, Japan
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Kitazawa Masashi
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Kuroi Takashi
Process Technology Development Division, Renesas Technology Corp., Itami, Hyogo 664-0005, Japan
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Kuroi Takashi
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Ikeda Taketoshi
Process Technology Development Division, Renesas Technology Corp., Itami, Hyogo 664-0005, Japan
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Umeda Hiroshi
Process Development Department, Process Technology Development Division, Production and Technology Unit, RENESAS Technology Corporation, 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Umeda Hiroshi
Process Technology Development Division, Renesas Technology Corp., Itami, Hyogo 664-0005, Japan
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Horita Katsuyuki
Process Technology Development Division, Renesas Technology Corp., Itami, Hyogo 664-0005, Japan
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Horita Katsuyuki
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Sawada Mahito
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Inuishi Masahide
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Kobayashi Kiyoteru
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Kobayashi Kiyoteru
Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Ishibashi Masato
Process Technology Development Division, Renesas Technology Corp., Itami, Hyogo 664-0005, Japan
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Ishibashi Masato
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Igarashi Motoshige
Process Technology Development Division, Renesas Technology Corp. 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
著作論文
- Novel Shallow Trench Isolation Process from Viewpoint of Total Strain Process Design for 45nm Node Devices and Beyond
- Layout-Independent Transistor with Stress-Controlled and Highly Manufacturable Shallow Trench Isolation Process
- Novel Shallow Trench Isolation Process from Viewpoint of Total Strain Process Design for 45 nm Node Devices and Beyond