Shigekawa Naoteru | Ntt Photonic Lab. Kanagawa Jpn
スポンサーリンク
概要
関連著者
-
Shigekawa Naoteru
Ntt Photonic Lab. Kanagawa Jpn
-
Shigekawa Naoteru
NTT Photonics Laboratories
-
Maeda Narihiko
Ntt Photonics Laboratories Ntt Corporation
-
Hiroki Masanobu
Ntt Photonics Laboratories Ntt Corporation
-
Shiojima Kenji
Ntt Photonics Laboratories
-
Yokoyama Haruki
Ntt Photonics Lab. Kanagawa Jpn
-
Nishimura Kazumi
NTT Photonics Laboratories
-
MAEDA Narihiko
NTT Photonics Laboratories, NTT Corporation
-
HIROKI Masanobu
NTT Photonics Laboratories, NTT Corporation
-
Suemitsu Tetsuya
Ntt Photonics Laboratories
著作論文
- P2-10 SAW-Semiconductor UV Sensor Using GaN Film(Short oral presentation for posters)
- Dependence of Electrical Properties of InAlN/GaN and InAlN/AlGaN/GaN Heterostructures FETs on the AlN Interlayer Thickness
- InAlN barrier layer for GaN-based FET : InAlN/AlGaN/GaN heterostructures with high electron mobility and flat surface
- InAlN barrier layer for GaN-based FET : InAlN/AlGaN/GaN heterostructures with high electron mobility and flat surface
- Intrinsic Transit Delay and Effective Electron Velocity of AlGaN/GaN High Electron Mobility Transistors
- Analysis of Passivation-Film-Induced Stress Effects on Electrical Properties in AlGaN/GaN HEMTs
- Compressively Strained InxAl1-xN/Al0.22Ga0.78N/GaN ($x = 0.245--0.325$) Heterostructure Field Effect Transistors with Regrown AlGaN Contact Layers
- DC Variable Harmonic Pass Band Operation of AlGaN/GaN Surface Acoustic Wave Devices
- Barrier Thickness Dependence of Photovoltaic Characteristics of InGaN/GaN Multiple Quantum Well Solar Cells
- Reduction of In Composition in Heavily Zn-Doped InAlGaAs Layers Grown at Low Temperature by Metalorganic Chemical Vapor Deposition