High-Rate Dry Etching of ZnO in BCl_3/CH_4/H_2 Plasmas
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-05-15
著者
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PARK Seong-Ju
Department of Materials Science and Engineering and Center for Optoelectronic Materials Research, Kw
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Park Seong-ju
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology (k-jist)
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Bae Jeong-woon
Micro And Nanotechnology Laboratory University Of Illinois
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YEOM Geun-Young
Department of Materials Engineering, Sungkyunkwan University
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Cho Nam-gil
Department Of Materials Science And Engineering Sung Kyun Kwan University
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Seong Tae-yeon
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology (k-jist)
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Jeong Chang-hyun
Department Of Materials Science And Engineering Sung Kyun Kwan University
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Kim Kyoung-kook
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology (k-jist)
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Kim Han-ki
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology (k-jist)
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ADESIDA Ilesanmi
Micro and Nanotechnology Laboratory, University of Illinois
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