Etch Properties of Gallium Nitride Using Chemically Assisted Ion Beam Etching (CAIBE)

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Etch Properties of Gallium Nitride Using Chemically Assisted Ion Beam Etching (CAIBE)
Properties and Applications of a Modified Dielectric Barrier Discharge Generated at Atmospheric Pressure
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Tin Oxide Films Deposited by Ozone-Assisted Thermal Chemical Vapor Deposition
Precise Depth Control of Silicon Etching Using Chlorine Atomic Layer Etching
High-Rate Dry Etching of ZnO in BCl3/CH4/H2 Plasmas
Characteristics of Ag Etching using Inductively Coupled Cl2-based Plasmas
A Study of Electrical Damage to a-Si:H Thin Film Transistor during Plasma Ashing by a Pin-to-Plate Type Atmospheric Pressure Plasma
The Effect of N2 Flow Rate in He/O2/N2 on the Characteristics of Large Area Pin-to-Plate Dielectric Barrier Discharge

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