Fabrication of Einzel Lens Array with One-Mask Reactive Ion Etching Process for Electron Micro-Optics
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概要
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In this paper, we report the fabrication of electron micro-optics by using deep reactive ion etching of three stacked silicon wafers. The three 120-μm-thick silicon wafers stacked with cavities are etched by a direct cavity through etching technique, where each wafer is bonded with a 200-μm-thick glass with through holes, thus separated by a space in part. An array of the electron micro-optics consisting of three electrodes can be fabricated by a one-mask process without assembling and alignment process. The dimensional profiles of a sample etched using this technique are also investigated. This micro-optics fabrication technology is useful for making future multiple electron beam devices with electron optics.
- 2011-10-25
著者
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Kawai Yusuke
Graduate School Of Engineering Tohoku University
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Esashi Masayoshi
The World Premier International Res. Center Initiative For Atom Molecule Materials Tohoku Univ.
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Ono Takahito
Graduate School Of Eng. Tohoku University
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Toda Masaya
Graduate School Of Engineering Tohoku Univ.
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Toda Masaya
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Miyashita Hidetoshi
Micro System Integration Center, Tohoku University, Sendai 980-8579, Japan
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Tomono Eiichi
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Ono Takahito
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Esashi Masayoshi
The World Premier International Research Center Advanced Institute for Materials Research (WPI-AIMR), Tohoku University, Sendai 980-8579, Japan
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