Deposition Process and Morphology of Metal–Phthalocyanine Thin Film Evaluated by Analyzing the Ultraviolet–Visible Spectrum and X-ray Diffraction Profile
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概要
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Copper (CuPc) and vanadyl-phthalocyanine (VOPc) thin films were prepared by a vapor deposition method on a Au(111) substrate. The orientations and morphologies of the copper and vanadyl-phthalocyanine thin films were investigated with ultraviolet/visible (UV/vis) spectra measured by UV/vis spectroscopy and with X-ray diffraction (XRD) profiles obtained by X-ray diffractometry. VOPc molecules deposited on the Au(111) substrate at 150 °C were parallel to the substrate and grew in pseudoepitaxy at a thickness of 50 nm. Conversely, CuPc molecules evaporated on the Au(111) substrate under the same conditions as VOPc molecules were in the $\alpha$-type phase and perpendicular to the substrate. This indicates that the CuPc molecules are not trapped at the trapping sites on the Au(111) substrate.
- 2010-01-25
著者
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Kojima Kenzo
Department Of Electrical Engineering Aichi Institute Of Technology
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Ru Jiasheng
Department Of Electrical Engineering Aichi Institute Of Technology
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Ochiai Shizuyasu
Department Of Electrical Engineering Aichi Institute Of Technology
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Mizutani Teruyoshi
Department of Electrical and Electronic Engineering, Aichi Institute of Technology, Toyota, Aichi 470-0529, Japan
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Ochiai Shizuyasu
Department of Electrical Engineering, Aichi Institute of Technology, Toyota, Aichi 470-0392, Japan
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Ru Jiasheng
Department of Electrical Engineering, Aichi Institute of Technology, Toyota, Aichi 470-0392, Japan
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Kojima Kenzo
Department of Electrical Engineering, Aichi Institute of Technology, Toyota, Aichi 470-0392, Japan
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