Diffusion of Point Defects in Silicon Crystals during Melt-Growth. III : Two Diffusor Model

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-04-15

著者

• Kojima Kenzo

  Department Of Electrical Engineering Aichi Institute Of Technology

• Kojima Kenzo

  Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology

• Kuroda Kenji

  Faculty Of Engineering The University Of Tokushima

• Kojima Kenichi

  Graduate School Of Integrated Science Yokohama City University

• Kojima Kenichi

  Department Of Physics Yokohama City University

• Kojima K

  Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology

• Kuroda K

  Central Research Laboratory Hitachi Ltd.

• Kojima Kazuyoshi

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• HABU Ryuichi

  Electronics Research Laboratories, Technical Development Bureau, Nippon Steel Corporation

• KOJIMA Kiyoshi

  Manufacturing Department, Crystal Growth Technical Group, NSC Electron Corporation

• HARADA Hirohumi

  Manufacturing Department, Crystal Growth Technical Group, NSC Electron Corporation

• TOMIURA Azusa

  Technical Development Bureau, Nippon Steel Corporation

• Habu R

  Nippon Steel Corp. Kawasaki Jpn

• Habu Ryuichi

  Electronics Research Laboratories Nippon Steel Corporation:(present Address)technical Research Cente

• Tomiura A

  Nippon Steel Corp. Kawasaki Jpn

• Harada H

  Yamaguchi Univ. Ube Jpn

• Tomiura Azusa

  Technical Development Bureau Nippon Steel Corporation

• KURODA Keigo

  Department of Materials Science, Faculty of Science, Hiroshima University

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