Harada H | Yamaguchi Univ. Ube Jpn
スポンサーリンク
概要
関連著者
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Harada H
Yamaguchi Univ. Ube Jpn
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HABU Ryuichi
Electronics Research Laboratories, Technical Development Bureau, Nippon Steel Corporation
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TOMIURA Azusa
Technical Development Bureau, Nippon Steel Corporation
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Habu R
Nippon Steel Corp. Kawasaki Jpn
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Habu Ryuichi
Electronics Research Laboratories Nippon Steel Corporation:(present Address)technical Research Cente
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Tomiura A
Nippon Steel Corp. Kawasaki Jpn
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Tomiura Azusa
Technical Development Bureau Nippon Steel Corporation
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Kojima Kenzo
Department Of Electrical Engineering Aichi Institute Of Technology
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Kojima Kenzo
Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology
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Sumino K
Tohoku Univ. Sendai Jpn
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Abe Tomoki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Kuroda Kenji
Faculty Of Engineering The University Of Tokushima
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Kojima Kenichi
Graduate School Of Integrated Science Yokohama City University
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Kojima Kenichi
Department Of Physics Yokohama City University
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Suezawa Masashi
Institute For Materials Research Tokoku Universily
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Kojima K
Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology
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Abe T
Seh Isobe R&d Center Shin-etsu Handotai Co. Ltd.
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Abe Takao
Shin-etsu Handotai
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Abe Takao
Shin-etsu Handotai Company
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Abe Takao
Seh R&d Center Shin-etsu Handotai Co. Ltd.
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Kuroda K
Central Research Laboratory Hitachi Ltd.
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Sumino Koji
Department Of Physics And Institute Of Solid State Physics Nanjing University
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Kojima Kazuyoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Suezawa M
Institute For Materials Research Tohoku University
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KOJIMA Kiyoshi
Manufacturing Department, Crystal Growth Technical Group, NSC Electron Corporation
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HARADA Hirohumi
Manufacturing Department, Crystal Growth Technical Group, NSC Electron Corporation
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Abe T
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Sasakura Hiroshi
Department Of Electrical Engineering And Electronics Faculty Of Engineering Tottori Univeristy
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Sasakura H
Department Of Materials Science University Of Osaka Prefecture
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Harada Hisamochi
Department Of Electronics Faculty Of Engineering Tottori University
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KURODA Keigo
Department of Materials Science, Faculty of Science, Hiroshima University
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Konishi R
Tottori Univ. Tottori
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Konishi Ryosuke
Department Of Electrical And Electronic Engineering Tottori University
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Ishibe Shoichi
Department Of Electronics Faculty Of Engineering Tottori University
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ABE Takao
Shin-Etsu Handotai Company, Limited
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SUEZAWA Masashi
The Research Institute for Iron, Steel and Other Metals, Tohoku University
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SUEZAWA Masashi
Institute for Materials Research,Tohoku University
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Suezawa Masashi
Institute For Materials Research Tohoku University
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Suezawa Masashi
The Research Institute For Iron Steel And Other Metals Tohoku University
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SUMINO Koji
Institute for Materials Research,Tohoku University
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Sumino Koji
Institute For Materials Research Tohoku University
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Sumino Koji
The Research Institute For Iron Steel And Other Metals
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HARADA Hirofumi
Shin-Etsu Handotai Company
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HARADA Hirofumi
The Research Institute for Iron, Steel and Other Metals, Tohoku University
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ABE Takao
The Research Institute for Iron, Steel and Other Metals, Tohoku University
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Iwasaki T
Univ. Electro‐communications Tokyo Jpn
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IWASAKI Toshio
Electronics Research Laboratories, Technical Development Bureau, Nippon Steel Corporation
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HARADA Hirohumi
Crystal Growth Technical Group, Manufacturing Department, NSC Electron Corporation
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Sumino Koji
Institute For Materials Reseach Tohoku University
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Iwasaki Toshio
Electronics Research Laboratories Technical Development Bureau Nippon Steel Corporation
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Harada Hirofumi
The Research Institute For Iron Steel And Other Metals Tohoku University
著作論文
- The Nature of Nitrogen-Oxygen Complexes in Silicon
- Nitrogen-Oxygen Complexes as Shallow Donors in Silicon Crystals
- Diffusion of Point Defects in Silicon Crystals during Melt-Growth. III : Two Diffusor Model
- Diffusion of Point Defects in Silicon Crystals during Melt-Growth. II : One Diffusor Model
- Diffusion Behavior of Point Defects in Si Crystal during Melt Growth IV : Numerical Analysis
- Mossbauer Study of Fe-Zr Alloys Formed at Interfaces between Fe and Zr Thin Films
- Mossbauer Study of Fe-Ti Alloys Formed at Interfaces between Fe and Ti Thin Films