Low-Temperature Growth of ZnO Thin Films by Linear Source Ultrasonic Spray Chemical Vapor Deposition
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概要
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ZnO films were prepared on soda-glass substrates and flexible polyimide films at low temperatures by linear source ultrasonic spray chemical vapor deposition without intentionally enhancing the energy of precursor reactions. Highly transparent ZnO films were deposited on both glass and polyimide at 180 °C using zinc acetate in a mixture of methanol and water. The deposition at low temperatures is attributed to water-activated precursor reactions.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-10-15
著者
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Fujita Shizuo
International Innovation Center Kyoto University
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Nishikawa Hiroyuki
Department Of Breast And Endocrine Surgery St. Marianna University School Of Medicine
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Kawaharamura Toshiyuki
Department of Electronic Science and Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510, Japan
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Kawaharamura Toshiyuki
Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan
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Nishikawa Hiroyuki
Department of Applied Physics and Chemistry, The University of Electro-Communications, Chofu, Tokyo 182-8585, Japan
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Nishinaka Hiroyuki
Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan
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